Atomic Layer Deposition of Superconductors

Orateur : Thomas PROSLIER (CEA-Saclay, IRFU/SACM)

I will present results obtained on the use of atomic layer deposition (ALD) to synthesize thin superconducting films and multilayer superconductor-insulator (S-I) hetero-structures. ALD applied to superconducting films opens the way for a variety of applications, including improving the performance and decreasing the cost of high energy particle accelerators, superconducting wires for energy storage, and bolometers for radiation detection. Furthermore, the atomic-scale thickness control afforded by ALD enables the study of superconductivity and associated phenomena in homogeneous layers in the ultra-thin film limit.

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