Brighter LEDs and better photovoltaics with spatial atomic layer deposition
Mercredi 9 mars 2016 11:00
- Duree : 1 heure
Lieu : Grenoble INP - Phelma, Laboratoire LMGP, 2ème étage, salle de séminaire, 3 parvis Louis Néel - 38000 Grenoble
Orateur : Kevin MUSSELMAN (University of Waterloo)
Atmospheric pressure spatial atomic layer deposition (AP-SALD) is capable of rapidly printing nanoscale thin films in atmosphere, making it very attractive for large-scale fabrication of next-generation electronic devices. Furthermore, AP-SALD permits accurate control of film compositions, such that film properties can be engineered for specific devices. In this seminar, recent progress in the fabrication of Nb2O5 and Zn(1-x)MgxO thin films by AP-SALD will be presented, along with their integration into next-generation photovoltaics and LEDs. Thin Nb2O5 interlayers were used to improve the separation of photoexcited charges in polymer solar cells, and Zn(1-x)MgxO alloys were used to reduce charge injection barriers in organometal halide perovskite LEDs and polymer LEDs, resulting in record luminances.
Contact : Michele.san-martin@grenoble-inp.fr
Discipline évènement : (Physique)
Entité organisatrice : (LMGP)
Nature évènement : (Séminaire)
Evènement répétitif : (Séminaire LMGP)
Site de l'évènement : Site Minatec
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